Intel already said they are moving to EUV from immersion lithography multi patterning, but tech isn't ready for them in another year or two. X-ray lithography has been used in the past, if I'm not mistaken. I didn't know there is an interest to bring it back. I know there is some research in Electron beam lithography, but jitter and slowness of it is a major hurdle.
What are you working on - graphene? In any case, very very interesting times ahead. Projections are that 2020 will see the last of the cycles (5nm) for Silicon. And that's only a few years away!
You don't know if Intel's tech is ready. It's classified for the machine manufacturers to disclose if Intel's their customer. I tried really hard to ask this Intel guy at IEDM what they're using for 10nm research and he wouldn't say anything.
E-beam lithography has been the work horse for research in fabrication for decades now. You can't get better resolution than E-beam lithography. The wavelength of an electron at 5kV acceleration is something like 0.017 nm. There are some crazy people who are trying to make E-beam systems for production processes (multiple beams, etc.), but I don't think E-beam will ever see use outside of research.
It might be due to my limited scope of knowledge, but how would one scale E-beam to a production capacity anyways?
Thanks for the link. I'll have to cross-read it with a lot of info though since it's 'a bit' over my head. I'm already lost at 1D and how it relates to, well, anything. I still can't warp my head around 1D geometry.
What are you working on - graphene? In any case, very very interesting times ahead. Projections are that 2020 will see the last of the cycles (5nm) for Silicon. And that's only a few years away!